Esaki Diodes Based on 2-D/3-D Heterojunctions
نویسندگان
چکیده
منابع مشابه
Silicon nanowire Esaki diodes.
We report on the fabrication and characterization of silicon nanowire tunnel diodes. The silicon nanowires were grown on p-type Si substrates using Au-catalyzed vapor-liquid-solid growth and in situ n-type doping. Electrical measurements reveal Esaki diode characteristics with peak current densities of 3.6 kA/cm(2), peak-to-valley current ratios of up to 4.3, and reverse current densities of up...
متن کاملNanofluidic diodes based on nanotube heterojunctions.
The mechanism of tuning charge transport in electronic devices has recently been implemented into the nanofluidic field for the active control of ion transport in nanoscale channels/pores. Here we report the first synthesis of longitudinal heterostructured SiO(2)/Al(2)O(3) nanotubes. The ionic transport through these nanotube heterojunctions exhibits clear current rectification, a signature of ...
متن کاملEsaki diodes live and learn
We report, as the result of shelf-life tests for Esaki diodes, the observation of minute but tangible reductions in the tunnel current after the lapse of half a century. The reduction could be attributed to 0.25% widening in the tunnel path.
متن کاملEsaki Diodes in van der Waals Heterojunctions with Broken-Gap Energy Band Alignment.
van der Waals (vdW) heterojunctions composed of two-dimensional (2D) layered materials are emerging as a solid-state materials family that exhibits novel physics phenomena that can power a range of electronic and photonic applications. Here, we present the first demonstration of an important building block in vdW solids: room temperature Esaki tunnel diodes. The Esaki diodes were realized in vd...
متن کاملAlloyed junction Ge Esaki diodes on Si substrates realised by aspect ratio trapping technique
A Ge Esaki diode is demonstrated on Si atop a coalesced epitaxial layer of Ge grown through narrow openings in SiO2 that are used to trap threading dislocations from the lattice mismatch. Spin-on doping was used to form the n-type junction and a controlled alloyed reaction of Al and Ge forms the p-type junction. At an alloy temperature of 5808C for 1 s, the Ge-on-Si diodes were found to have a ...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: IEEE Transactions on Electron Devices
سال: 2018
ISSN: 0018-9383,1557-9646
DOI: 10.1109/ted.2018.2867337